DocumentCode
1047226
Title
Comments on "Peripheral and diffused layer effects on doping profiles"
Author
Basavaraj, T.N. ; Bhattacharyya, A.B.
Author_Institution
Indian Institute of Technology, New Delhi, India
Volume
21
Issue
1
fYear
1974
Firstpage
125
Lastpage
126
Abstract
A simple method is described for the characterization of uniformly doped epitaxial layers from the capacitance-voltage measurements of a diffused p-n junction, considering the peripheral effect due to the sidewall junction and the diffused layer effect due to the depletion region in the heavily doped side of the junction.
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1974.17874
Filename
1477689
Link To Document