DocumentCode :
1047300
Title :
A comparison between N+-P-P+and P+-N-N+silicon IMPATT diodes
Author :
Lee, Charles M. ; Haddad, George I. ; Lomax, Ronald J.
Author_Institution :
Bell Laboratories, Murray Hill, N. J.
Volume :
21
Issue :
2
fYear :
1974
fDate :
2/1/1974 12:00:00 AM
Firstpage :
137
Lastpage :
141
Abstract :
A one-dimensional large-signal computer program that incorporates the material parameters of Si in an exact manner has been employed to compare the efficiency, power output, and other important operating characteristics of both complementary structures of Si IMPATT diodes. The results presented here differ greatly from those already reported by other authors.
Keywords :
Charge carrier processes; Dielectric constant; Diodes; Electron mobility; Ionization; Numerical models; Physics; Radio frequency; Silicon; Stability;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1974.17882
Filename :
1477697
Link To Document :
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