DocumentCode
1047924
Title
Direct evidence for a two-magnon contribution to the FMR relaxation in Ni-Fe thin films
Author
Patton, Carl E. ; Ono, Fumie ; Takahashi, Minoru
Author_Institution
Tohoku University, Sendai, Japan
Volume
7
Issue
3
fYear
1971
fDate
9/1/1971 12:00:00 AM
Firstpage
760
Lastpage
763
Abstract
An off-resonance technique, which permits the relaxation rate to be determined as a function of bias field, has been applied to Ni-Fe thin films for the first time. The data provide direct evidence for a strong two-magnon scattering contribution to the losses. The effective linewidth for a 1300-Å film at 9 GHz peaks near the parallel resonance position with
Oe. It decreases above and below the ferromagnetic resonance (FMR).
is reduced to 60 Oe at a bias 100 Oe below resonance. This sharp falloff indicates that the scattering is due to relatively large inhomogeneities, 3000Å or larger in size. The falloff above resonance is due to a decrease in both the density of states and coupling for the degenerate spin waves. The effective line shift due to spin-wave scattering is also strongly field dependent. It changes by more than 30 Oe in the vicinity of resonance. The data show that line-shift effects should completely obscure ripple field shifts (0.1-1 Oe) which can, in concept, be measured by FMR techniques.
Oe. It decreases above and below the ferromagnetic resonance (FMR).
is reduced to 60 Oe at a bias 100 Oe below resonance. This sharp falloff indicates that the scattering is due to relatively large inhomogeneities, 3000Å or larger in size. The falloff above resonance is due to a decrease in both the density of states and coupling for the degenerate spin waves. The effective line shift due to spin-wave scattering is also strongly field dependent. It changes by more than 30 Oe in the vicinity of resonance. The data show that line-shift effects should completely obscure ripple field shifts (0.1-1 Oe) which can, in concept, be measured by FMR techniques.Keywords
Ferromagnetic resonance; Iron-nickel films; Magnons; Nickel-iron films; Automatic frequency control; Equations; Klystrons; Magnetic field measurement; Magnetic fields; Magnetic resonance; Magnetoelasticity; Scattering; Surface waves; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1971.1067212
Filename
1067212
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