• DocumentCode
    1047924
  • Title

    Direct evidence for a two-magnon contribution to the FMR relaxation in Ni-Fe thin films

  • Author

    Patton, Carl E. ; Ono, Fumie ; Takahashi, Minoru

  • Author_Institution
    Tohoku University, Sendai, Japan
  • Volume
    7
  • Issue
    3
  • fYear
    1971
  • fDate
    9/1/1971 12:00:00 AM
  • Firstpage
    760
  • Lastpage
    763
  • Abstract
    An off-resonance technique, which permits the relaxation rate to be determined as a function of bias field, has been applied to Ni-Fe thin films for the first time. The data provide direct evidence for a strong two-magnon scattering contribution to the losses. The effective linewidth for a 1300-Å film at 9 GHz peaks near the parallel resonance position with \\Delta (\\omega /\\gamma )_{eff}\\approx 200 Oe. It decreases above and below the ferromagnetic resonance (FMR). \\Delta (\\omega /\\gamma )_{eff} is reduced to 60 Oe at a bias 100 Oe below resonance. This sharp falloff indicates that the scattering is due to relatively large inhomogeneities, 3000Å or larger in size. The falloff above resonance is due to a decrease in both the density of states and coupling for the degenerate spin waves. The effective line shift due to spin-wave scattering is also strongly field dependent. It changes by more than 30 Oe in the vicinity of resonance. The data show that line-shift effects should completely obscure ripple field shifts (0.1-1 Oe) which can, in concept, be measured by FMR techniques.
  • Keywords
    Ferromagnetic resonance; Iron-nickel films; Magnons; Nickel-iron films; Automatic frequency control; Equations; Klystrons; Magnetic field measurement; Magnetic fields; Magnetic resonance; Magnetoelasticity; Scattering; Surface waves; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1971.1067212
  • Filename
    1067212