DocumentCode :
1047924
Title :
Direct evidence for a two-magnon contribution to the FMR relaxation in Ni-Fe thin films
Author :
Patton, Carl E. ; Ono, Fumie ; Takahashi, Minoru
Author_Institution :
Tohoku University, Sendai, Japan
Volume :
7
Issue :
3
fYear :
1971
fDate :
9/1/1971 12:00:00 AM
Firstpage :
760
Lastpage :
763
Abstract :
An off-resonance technique, which permits the relaxation rate to be determined as a function of bias field, has been applied to Ni-Fe thin films for the first time. The data provide direct evidence for a strong two-magnon scattering contribution to the losses. The effective linewidth for a 1300-Å film at 9 GHz peaks near the parallel resonance position with \\Delta (\\omega /\\gamma )_{eff}\\approx 200 Oe. It decreases above and below the ferromagnetic resonance (FMR). \\Delta (\\omega /\\gamma )_{eff} is reduced to 60 Oe at a bias 100 Oe below resonance. This sharp falloff indicates that the scattering is due to relatively large inhomogeneities, 3000Å or larger in size. The falloff above resonance is due to a decrease in both the density of states and coupling for the degenerate spin waves. The effective line shift due to spin-wave scattering is also strongly field dependent. It changes by more than 30 Oe in the vicinity of resonance. The data show that line-shift effects should completely obscure ripple field shifts (0.1-1 Oe) which can, in concept, be measured by FMR techniques.
Keywords :
Ferromagnetic resonance; Iron-nickel films; Magnons; Nickel-iron films; Automatic frequency control; Equations; Klystrons; Magnetic field measurement; Magnetic fields; Magnetic resonance; Magnetoelasticity; Scattering; Surface waves; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1971.1067212
Filename :
1067212
Link To Document :
بازگشت