DocumentCode :
1048204
Title :
Annealing effects in plated-wire memory elements, part II: Recrystallization in permalloy films
Author :
Marquardt, Shirly J. ; Kench, John R.
Author_Institution :
Honeywell Corporate Research Center, Hopkins, Minn.
Volume :
7
Issue :
4
fYear :
1971
fDate :
12/1/1971 12:00:00 AM
Firstpage :
858
Lastpage :
860
Abstract :
Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200°C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range 180 and 230°C, and it is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
Keywords :
Annealing; Permalloy films; Plated-wire memories; Aging; Annealing; Copper; Electrons; Grain size; NASA; Optical microscopy; Size measurement; Temperature distribution; Wires;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1971.1067239
Filename :
1067239
Link To Document :
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