Title :
Annealing effects in plated-wire memory elements, part II: Recrystallization in permalloy films
Author :
Marquardt, Shirly J. ; Kench, John R.
Author_Institution :
Honeywell Corporate Research Center, Hopkins, Minn.
fDate :
12/1/1971 12:00:00 AM
Abstract :
Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200°C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range 180 and 230°C, and it is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
Keywords :
Annealing; Permalloy films; Plated-wire memories; Aging; Annealing; Copper; Electrons; Grain size; NASA; Optical microscopy; Size measurement; Temperature distribution; Wires;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1971.1067239