• DocumentCode
    1048552
  • Title

    Characterization of Amorphous GMI Thin-Film Meander Trilayers

  • Author

    Giouroudi, Ioanna ; Hauser, Hans ; Musiejovsky, L. ; Steurer, J.

  • Author_Institution
    Fac. of Electr. Eng. & Inf. Technol., Vienna Univ. of Technol.
  • Volume
    6
  • Issue
    4
  • fYear
    2006
  • Firstpage
    970
  • Lastpage
    973
  • Abstract
    This paper presents the magnetic properties of CoFeB trilayer thin films in relation to the high-frequency impedance responses. Fifty- and 100-nm-thin amorphous layers with a central 100- and 200-nm-thin Cu layer, respectively, were sputtered onto a thermally oxidized Si wafer. 300-mum-long meanders of 3-20-mum width were structured using a standard mask with various meanders, which were connected in series and were then formed by plasma etching. Magnetization curves, parallel to the easy axis, and hard axis of uniaxial anisotropy, were measured by the magnetooptical Kerr effect exhibiting anisotropy fields of around 2 kA/m and low coercivity in the hard-axis direction, depending on the film thickness. The magnetoimpedance (MI) effect was measured manually from 10 MHz to 1 GHz by means of a network analyzer using the reflected wave through the sample. The maximum effect occurred for both samples at 850 MHz
  • Keywords
    Kerr magneto-optical effect; amorphous magnetic materials; boron alloys; cobalt alloys; giant magnetoresistance; iron alloys; magnetic multilayers; magnetic thin films; magnetisation; sputtered coatings; 100 nm; 200 nm; 300 micron; 50 nm; CoFeB; GMI effect; amorphous GMI; giant magnetoimpedance; hard-axis direction; high-frequency impedance responses; magnetic properties; magnetization curves; magnetooptical Kerr effect; network analyzer; plasma etching; standard mask; thermally oxidized silicon wafer; thin amorphous layers; thin-film meander trilayers; trilayer thin films; uniaxial anisotropy; Amorphous materials; Anisotropic magnetoresistance; Impedance; Magnetic field measurement; Magnetic films; Magnetic properties; Plasma applications; Plasma measurements; Sputtering; Transistors; Giant magnetoimpedance (GMI) effect; thin films;
  • fLanguage
    English
  • Journal_Title
    Sensors Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1530-437X
  • Type

    jour

  • DOI
    10.1109/JSEN.2006.877982
  • Filename
    1661580