Title :
II-1 a comparison of two types of buried-channel charge-coupled devices
Author :
Brodersen, R.W. ; Tasch, A.F.
fDate :
11/1/1974 12:00:00 AM
Keywords :
Charge coupled devices; Charge measurement; Current measurement; Density measurement; Fabrication; Image storage; Impurities; Instruments; Ion implantation; Noise measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1974.18010
