• DocumentCode
    1048590
  • Title

    Initiation and propagation of delaminations at the underfill/passivation interface relevant to flip-chip assemblies

  • Author

    McAdams, Brian J. ; Pearson, Raymond A.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Lehigh Univ., Bethlehem, PA, USA
  • Volume
    4
  • Issue
    2
  • fYear
    2004
  • fDate
    6/1/2004 12:00:00 AM
  • Firstpage
    169
  • Lastpage
    175
  • Abstract
    A crucial reliability issue for flip-chip microelectronic assemblies is the mechanical integrity of the various bi-material interfaces present. Understanding the mechanics and physics of adhesion is continually reiterated in the International Technology Roadmap for Semiconductors (ITRS). With current trends in the microelectronics industry pushing for smaller and smaller feature sizes, small-scale delamination and initiation are becoming more of a focus in adhesion studies. Our work looks at the application of a stress singularity approach to the initiation problem at various geometric singularities found at interfaces in flip-chip assemblies. Moreover, we compare the adhesion of the same interfaces using standard fracture mechanics. Specifically, several underfill/polyimide interfaces are tested, in both a standard double cantilever beam geometry and a tensile butt joint geometry. The results show a direct correlation between stress intensity values for both the initiation of delaminations and the propagation of existing delaminations. Modified tensile butt joint geometry testing shows an inverse relationship between singularity strength and overall joint strength.
  • Keywords
    adhesion; delamination; flip-chip devices; fracture mechanics; integrated circuit bonding; interface structure; microassembling; stress effects; International Technology Roadmap for Semiconductors; adhesion studies; bi-material interfaces; bonding; delaminations; double cantilever beam geometry; flip-chip devices; flip-chip microelectronic assemblies; geometric singularities; interface adhesion; joint strength; materials reliability; mechanical integrity; microelectronics industry; passivation interface; polyimide interfaces; singularity strength; small-scale delamination; standard fracture mechanics; stress intensity values; stress singularity approach; tensile butt joint geometry; underfill interface; Adhesives; Assembly; Delamination; Geometry; Microelectronics; Passivation; Physics; Polyimides; Tensile stress; Testing; Bonding; flip-chip devices; interface adhesion; materials reliability;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2004.829069
  • Filename
    1318621