Title :
Failure distributions of successive dielectric breakdown events
Author :
Pompl, Thomas ; Kerber, Martin
Author_Institution :
Infineon Technol., Munich, Germany
fDate :
6/1/2004 12:00:00 AM
Abstract :
Experimental time-dependent dielectric breakdown (TDDB) distributions of standard CMOS hardware are used to demonstrate the problem of detecting a range of successive breakdown events, e.g., from the 5th to the 20th. Specifically, the range and the statistical distribution of successive breakdown events significantly change the shape of the cumulative failure distribution, which is crucial for the low percentile extrapolation. The observed behavior affects the correlation of integrated circuit failure distributions to dielectric breakdown as it is expected that circuit malfunction is caused by a range of successive breakdown events.
Keywords :
CMOS integrated circuits; Monte Carlo methods; electric breakdown; failure analysis; integrated circuit reliability; statistical distributions; CMOS integrated circuits; breakdown events detection; circuit malfunction; dielectric breakdown events; integrated circuit failure distributions; oxide reliability; standard CMOS hardware; time-dependent dielectric breakdown distributions; ultrathin gate oxides; Circuit testing; Dielectric breakdown; Electric breakdown; Event detection; Extrapolation; Hardware; Leakage current; Statistical distributions; Statistics; Stress; CMOS integrated circuits; dielectric breakdown; oxide reliability; ultrathin gate oxides;
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
DOI :
10.1109/TDMR.2004.826586