DocumentCode :
1048704
Title :
Failure distributions of successive dielectric breakdown events
Author :
Pompl, Thomas ; Kerber, Martin
Author_Institution :
Infineon Technol., Munich, Germany
Volume :
4
Issue :
2
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
263
Lastpage :
267
Abstract :
Experimental time-dependent dielectric breakdown (TDDB) distributions of standard CMOS hardware are used to demonstrate the problem of detecting a range of successive breakdown events, e.g., from the 5th to the 20th. Specifically, the range and the statistical distribution of successive breakdown events significantly change the shape of the cumulative failure distribution, which is crucial for the low percentile extrapolation. The observed behavior affects the correlation of integrated circuit failure distributions to dielectric breakdown as it is expected that circuit malfunction is caused by a range of successive breakdown events.
Keywords :
CMOS integrated circuits; Monte Carlo methods; electric breakdown; failure analysis; integrated circuit reliability; statistical distributions; CMOS integrated circuits; breakdown events detection; circuit malfunction; dielectric breakdown events; integrated circuit failure distributions; oxide reliability; standard CMOS hardware; time-dependent dielectric breakdown distributions; ultrathin gate oxides; Circuit testing; Dielectric breakdown; Electric breakdown; Event detection; Extrapolation; Hardware; Leakage current; Statistical distributions; Statistics; Stress; CMOS integrated circuits; dielectric breakdown; oxide reliability; ultrathin gate oxides;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2004.826586
Filename :
1318631
Link To Document :
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