DocumentCode :
1049124
Title :
Temperature dependence of turn-on voltage of gold-doped MOSFETs
Author :
Sproul, M.E. ; Nassibian, Armenag G.
Author_Institution :
W. A. Institute of Technology, Australia
Volume :
22
Issue :
1
fYear :
1975
fDate :
1/1/1975 12:00:00 AM
Firstpage :
8
Lastpage :
14
Abstract :
The temperature dependence of the turn-on voltage of gold-doped and control n- and p-channel MOSFETs has been measured. To account for the large positive shift of turn-on voltage, VT Au, of gold treated n- and p-channel devices, it has been proposed that the gold eliminates the fast interface traps of continuous energy distribution, and that additional acceptor states very close to the valence band can cause additional charge QA Au, which can dominate the effect of acceptor and donor levels of gold ions in the silicon surface space charge region, and can also over-compensate the surface state charge, Qss. To fit the theoretical VT Auversus T curve to experimental curves, an accumulation of electrically active gold within the surface space charge region has been considered in n-channel devices and depletion in p-channel devices.
Keywords :
Gold; Hall effect; Helium; MOSFETs; Silicon; Space charge; Surface fitting; Temperature control; Temperature dependence; Voltage control;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1975.18063
Filename :
1477898
Link To Document :
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