• DocumentCode
    1049132
  • Title

    The effect of emitter doping gradient on fTin microwave bipolar transistors

  • Author

    Kerr, John Anthony ; Berz, Feodora

  • Author_Institution
    Mullard Hazel Grove, Ltd., Stockport, Cheshire, England
  • Volume
    22
  • Issue
    1
  • fYear
    1975
  • fDate
    1/1/1975 12:00:00 AM
  • Firstpage
    15
  • Lastpage
    20
  • Abstract
    The effect of the emitter doping gradient on the transit time in microwave bipolar transistor structures has been investigated. The range of gradients was chosen to cover those typically found in shallow phosphorus- and arsenic-emitter diffusions. The results show that there is appreciable free carrier storage in the emitter space charge layer. The Storage decreases when the doping gradient in the junction is increased. This effect can account for the improved fTvalues of arsenic emitter transistors. The free carrier storage in the emitter space charge layer is compared with predictions deduced from the theoretical analysis of Morgan and Smits [1].
  • Keywords
    Bipolar transistors; Doping; Helium; Impurities; Ionization; Laboratories; Microwave measurements; Microwave transistors; Space charge; Tail;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18064
  • Filename
    1477899