DocumentCode :
1049437
Title :
Device physics of integrated injection logic
Author :
Klaassen, F.M.
Volume :
22
Issue :
3
fYear :
1975
fDate :
3/1/1975 12:00:00 AM
Firstpage :
145
Lastpage :
152
Abstract :
After a brief review of relevant device parameters, characterizing the inversely operating multicollector n-p-n transistor and the lateral p-n-p transistor which make up an I^{2}L basic cell, some electronic circuit properties of this gate are discussed quantitively. Analytic expressions are derived for the transfer characteristics, the noise margin and the propagation delay time per gate in relation to the cell geometry, fan-out, doping profiles, and recombination properties. These expressions are compared with experimental and numerical circuit simulation results.
Keywords :
Capacitance; Circuit noise; Doping profiles; Electronic circuits; Frequency; Logic devices; Physics; Propagation delay; Spontaneous emission; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1975.18093
Filename :
1477928
Link To Document :
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