• DocumentCode
    1049437
  • Title

    Device physics of integrated injection logic

  • Author

    Klaassen, F.M.

  • Volume
    22
  • Issue
    3
  • fYear
    1975
  • fDate
    3/1/1975 12:00:00 AM
  • Firstpage
    145
  • Lastpage
    152
  • Abstract
    After a brief review of relevant device parameters, characterizing the inversely operating multicollector n-p-n transistor and the lateral p-n-p transistor which make up an I^{2}L basic cell, some electronic circuit properties of this gate are discussed quantitively. Analytic expressions are derived for the transfer characteristics, the noise margin and the propagation delay time per gate in relation to the cell geometry, fan-out, doping profiles, and recombination properties. These expressions are compared with experimental and numerical circuit simulation results.
  • Keywords
    Capacitance; Circuit noise; Doping profiles; Electronic circuits; Frequency; Logic devices; Physics; Propagation delay; Spontaneous emission; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18093
  • Filename
    1477928