Series resistance effects in semiconductor CV profiling

The effects of series resistance on semiconductor doping profiles obtained by conventional CV analysis are discussed, and it is shown that this resistance can cause extremely large errors in the profiles. It is demonstrated that the existence of such errors can be inferred from suitable RF phase angle measurements obtained during the CV profiling process, and that this information can be used to correct distorted profiles. A theoretical analysis and several computer simulations are presented in order to illustrate the nature of the problem and the methods by which accurate profiles can be obtained. All of the behavior predicted by computer simulations is verified by experimental examples.