DocumentCode :
1049876
Title :
Second breakdown of IC structured power transistors
Author :
Demizu, Kiyoshi ; Yamamoto, Yoshimichi
Author_Institution :
Mitsubishi Electric Corporation, Itami, Japan
Volume :
22
Issue :
6
fYear :
1975
fDate :
6/1/1975 12:00:00 AM
Firstpage :
352
Lastpage :
353
Abstract :
The authors attempt to characterize second breakdown as heating phenomena which can occur in one of two places, either at the p-n interface at low current or at the n-n+interface at higher current. The transition point between these two states occurs at a current It= qVsatNDS where the n-region field is uniform and at a voltage Vt= εsatWepijust necessary to saturate the drift velocity in Wepi.
Keywords :
Conductivity; Electric breakdown; Electric resistance; Electron mobility; Electronic ballasts; Epitaxial layers; Power transistors; Semiconductor process modeling; Temperature; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1975.18136
Filename :
1477971
Link To Document :
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