Planar Concave Grating Demultiplexer With High Reflective Bragg Reflector Facets

Author

Brouckaert, J. ; Bogaerts, W. ; Selvaraja, S. ; Dumon, P. ; Baets, Roel ; Van Thourhout, D.

Author_Institution

Ghent Univ., Ghent

Volume

20

Issue

4

fYear

2008

Firstpage

309

Lastpage

311

Abstract

We present measurement results of an ultracompact four-channel silicon-on-insulator planar concave grating demultiplexer fabricated in a complimentary metal-oxide-semiconductor line using deep-ultraviolet lithography. The demultiplexer has four output channels separated by 20 nm and a footprint of only 280 mum times 150 mum. The crosstalk is better than 25 dB and the on-chip loss is drastically reduced down to 1.9 dB by replacing each facet by a second-order Bragg reflector.

Keywords

demultiplexing equipment; diffraction gratings; distributed Bragg reflectors; integrated optics; integrated optoelectronics; optical communication equipment; optical crosstalk; optical fabrication; optical losses; silicon-on-insulator; ultraviolet lithography; complimentary metal-oxide-semiconductor line; crosstalk; deep-ultraviolet lithography; distributed Bragg reflector; on-chip loss; output channels; second-order Bragg reflector; ultracompact four-channel sllicon-on-lnsulator planar concave grating demultiplexer; Arrayed waveguide gratings; Bragg gratings; Crosstalk; Distributed Bragg reflectors; Etching; Insertion loss; Optical arrays; Optical materials; Optical waveguides; Silicon on insulator technology; Demultiplexing; diffraction; distributed Bragg reflector (DBR); grating; silicon-on-insulator (SOI);

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2007.915585

Filename

4443140