• DocumentCode
    1050851
  • Title

    Improvement in the temperature characteristics of 630 nm band InGaAlP multiquantum-well laser diodes using a 15 degrees misoriented substrate

  • Author

    Watanabe, Manabu ; Rennie, J. ; Okajima, M. ; Hatakoshi, G.

  • Author_Institution
    Toshiba Corp., Kawasaki, Japan
  • Volume
    29
  • Issue
    3
  • fYear
    1993
  • Firstpage
    250
  • Lastpage
    252
  • Abstract
    InGaAlP multiquantum-well (MQW) laser diodes were prepared on a
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; semiconductor epitaxial layers; semiconductor lasers; vapour phase epitaxial growth; 15 degrees misorientation; 52 degC; 630 nm band; 630 to 632 nm; CW conditions; CW operation; GaAs substrates; InGaAsP; InGaAsP-GaAs; LD; MQW; NQW heterointerfaces; misoriented substrate; multiquantum-well laser diodes; semiconductors; temperature characteristics; visible lasers;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19930172
  • Filename
    277152