• DocumentCode
    1051953
  • Title

    p-MOSFET parameters at cryogenic temperatures

  • Author

    Maddox, Roy L.

  • Author_Institution
    Rockwell International Electronics Operations, Anaheim, CA
  • Volume
    23
  • Issue
    1
  • fYear
    1976
  • fDate
    1/1/1976 12:00:00 AM
  • Firstpage
    16
  • Lastpage
    21
  • Abstract
    p-channel MOSFET parameters measured at 300 K, 77 K, and 4.2 K are discussed; these include I-V characteristic curves, channel conductance, transconductance, threshold voltage, field effect mobility, and forward and reverse p+n junction characteristics. Some qualitative explanations of the dependence of the data on temperature and substrate doping concentration are given. Interesting LHe phenomena are highlighted and discussed in terms of accepted solid state models.
  • Keywords
    Cryogenics; Dielectric substrates; Diodes; Doping; Forward contracts; MOSFET circuits; Temperature; Testing; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18340
  • Filename
    1478354