DocumentCode
1051953
Title
p-MOSFET parameters at cryogenic temperatures
Author
Maddox, Roy L.
Author_Institution
Rockwell International Electronics Operations, Anaheim, CA
Volume
23
Issue
1
fYear
1976
fDate
1/1/1976 12:00:00 AM
Firstpage
16
Lastpage
21
Abstract
p-channel MOSFET parameters measured at 300 K, 77 K, and 4.2 K are discussed; these include I-V characteristic curves, channel conductance, transconductance, threshold voltage, field effect mobility, and forward and reverse p+n junction characteristics. Some qualitative explanations of the dependence of the data on temperature and substrate doping concentration are given. Interesting LHe phenomena are highlighted and discussed in terms of accepted solid state models.
Keywords
Cryogenics; Dielectric substrates; Diodes; Doping; Forward contracts; MOSFET circuits; Temperature; Testing; Threshold voltage; Transconductance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1976.18340
Filename
1478354
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