DocumentCode :
1051973
Title :
High-Frequency and Noise Performances of 65-nm MOSFET at Liquid Nitrogen Temperature
Author :
Siligaris, Alexandre ; Pailloncy, Guillaume ; Delcourt, Sébastien ; Valentin, Raphael ; Lepilliet, Sylvie ; Danneville, François ; Gloria, Daniel ; Dambrine, Gilles
Author_Institution :
CEA/LETI/DCIS/SCME, Grenoble
Volume :
53
Issue :
8
fYear :
2006
Firstpage :
1902
Lastpage :
1908
Abstract :
In this paper, the high-frequency properties of MOSFETs at low-temperature operation are investigated through measurements and electrical simulations. The experimental results show that the device achieves a 335-GHz fmax and a 300-GHz ft when operating at low temperature (78 K), which constitutes, respectively, a 78% and 34% improvement compared to the room temperature performances (296 K). The minimum noise figure NFmin decreases from 1.4 dB (296 K) to 0.5 dB at 30 GHz (78 K), while the associated gain increases from 8 to 12 dB
Keywords :
MOSFET; cryogenic electronics; semiconductor device measurement; 0.5 dB; 12 dB; 30 GHz; 300 GHz; 335 GHz; 65 nm; 78 K; MOSFET; electrical simulations; high-frequency characterization; high-frequency noise; liquid nitrogen temperature; low-temperature operation; noise performance; Electric variables measurement; Hafnium; Low-frequency noise; MOS devices; MOSFET circuits; Nitrogen; Noise figure; Noise measurement; Performance gain; Temperature sensors; HF characterization; High-frequency noise; MOSFET; low temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.877872
Filename :
1661893
Link To Document :
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