• DocumentCode
    1052009
  • Title

    Two-dimensional carrier flow in a transistor structure under nonisothermal conditions

  • Author

    Gaur, Santosh P. ; Navon, David H.

  • Author_Institution
    IBM, Poughkeepsie, NY
  • Volume
    23
  • Issue
    1
  • fYear
    1976
  • fDate
    1/1/1976 12:00:00 AM
  • Firstpage
    50
  • Lastpage
    57
  • Abstract
    A two-dimensional mathematical model is developed to predict the internal behavior of power transistors operating under steady-state conditions. This model includes the internal self-heating effects in power transistors and is applicable to predict the transistor behavior under high-current and high-voltage operating conditions. The complete set of partial differential equations governing the bipolar semiconductor device behavior under nonisothermal conditions is solved by numerical techniques without assuming internal junctions and other conventional approximations. Input parameters for this model are the dimension of the device, doping profile, mobility expressions, generation-recombination model, and the boundary conditions for external contacts. Computer results of the analysis of a typical power transistor design are presented for specified operating conditions. The current density, electrostatic potential, carrier charge density, and temperature distribution plots within the transistor structure illustrate the combined effect of the electrothermal interaction, base conductivity modulation, current crowding, base pushout, space charge layer widening, and current spreading phenomena in power transistors.
  • Keywords
    Boundary conditions; Current density; Doping profiles; Mathematical model; Partial differential equations; Power transistors; Predictive models; Semiconductor devices; Semiconductor process modeling; Steady-state;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18346
  • Filename
    1478360