DocumentCode :
1052196
Title :
The Influence of TiN Thickness and 
Formation Method on the Structural and Electrical Properties of ; equivalent oxide thickness (EOT); hafnium oxide <formula formulatype=)
$(hbox{HfO}_{2})$ ; high- $kappa$
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2021718
Filename :
5061882
Link To Document :
