DocumentCode
1052196
Title
The Influence of TiN Thickness and
Formation Method on the Structural and Electrical Properties of ; equivalent oxide thickness (EOT); hafnium oxide <formula formulatype=)
$(hbox{HfO}_{2})$ ; high- $kappa$ dielectrics; interfacial oxide;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2009.2021718
Filename
5061882
Link To Document