DocumentCode
1052231
Title
Electrodeposited films with island structure Ni-Co layers
Author
Kawakami, Susumu ; Muramatsu, Kiyohide ; Sakai, Sukeyoshi
Author_Institution
Fujitsu Laboratories, Ltd., Kawasaki, Japan.
Volume
9
Issue
3
fYear
1973
fDate
9/1/1973 12:00:00 AM
Firstpage
503
Lastpage
507
Abstract
An island structure Ni-Co layer is deposited from a complexing bath containing glycine as a ligand agent. For multilayered films with this layer, it is shown that the Ni-Co islands are important to obtain a fluctuation of local anisotropy. Clear correlations are found among various parameters to evaluate memory characteristics of magnetic films. Especially, it is shown that it is possible to explain theoretically the correlation between write threshold and digit disturb threshold. The NDRO quality is strongly dependent on the fluctuation of local anisotropy. The island structure deposits are shown to be determined by a positively charged complex ion in the bath.
Keywords
Multilayer magnetic films; Plated-wire memories; Amino acids; Amorphous materials; Anisotropic magnetoresistance; Cobalt; Coercive force; Copper; Fluctuations; Magnetic films; Substrates; Wires;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1973.1067588
Filename
1067588
Link To Document