Title :
Consideration of feed-through voltage in amorphous-Si TFT´s
Author :
Takabatake, Masaru ; Tsumura, Makoto ; Nagae, Yoshiharu
Author_Institution :
Hitachi Ltd., Ibaraki, Japan
fDate :
10/1/1993 12:00:00 AM
Abstract :
Feedthrough voltage is an important factor in designing integrated data drive circuits and display area in thin-film-transistor liquid-crystal displays (TFT LCDs). With respect to feedthrough voltage, only the gate-source overlay capacitance has been considered in amorphous-Si (a-Si) TFTs, because of their staggered structure with overlap area. It is pointed out that, in a-Si TFTs designed as active elements, feedthrough voltage is mainly due to the carrier redistribution. The main reason is that, since the field-effect mobility is low (W/L>1), the leakage current must be kept low (L⩾10 μm), and an active layer is inserted in the overlap area (unlike the case with MOS device structures), the area of the active layer is large. Taking the carrier redistribution into account, the maximum difference between the voltage obtained using the modified model and the experimental voltage is within 20%. By comparison, the results obtained using the previous model for TFTs are approximately three times smaller than the experimental results
Keywords :
amorphous semiconductors; capacitance; carrier mobility; elemental semiconductors; insulated gate field effect transistors; leakage currents; liquid crystal displays; semiconductor device models; silicon; thin film transistors; TFT; active layer; amorphous Si; carrier redistribution; feed-through voltage; feedthrough voltage; field-effect mobility; gate-source overlay capacitance; integrated data drive circuits; leakage current; liquid-crystal displays; modified model; overlap area; staggered structure; thin-film-transistor; Amorphous materials; Capacitance; Circuits; Constitution; Displays; Drives; Leakage current; MOS devices; Thin film transistors; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on