• DocumentCode
    1052759
  • Title

    GaAs microwave power FET

  • Author

    Fukuta, Masumi ; Suyama, Katsuhiko ; Suzuki, Hidetake ; Ishikawa, Hajime

  • Author_Institution
    Fujitsu Laboratories Ltd., Kawasaki, Japan
  • Volume
    23
  • Issue
    4
  • fYear
    1976
  • fDate
    4/1/1976 12:00:00 AM
  • Firstpage
    388
  • Lastpage
    394
  • Abstract
    A design consideration for an X-band GaAs power FET, features of the fabrication process, and electrical characteristics of the FET are described. Interdigitated 53 source and 52 drain electrodes and an overlaid gate electrode for connecting 104 Schottky gates in parallel have been introduced to achieve a 1.5-µm-long and 5200-µm-wide gate FET. A sheet grounding technique has been developed in order to minimize the common source lead inductance (L8= 50 pH). The resulting devices can produce 0.7-W and 1.6-W saturation output power at 10 GHz and 8 GHz, respectively. At 6 GHz, a linear gain of 7 dB, an output power of 0.85 W at 1-dB gain compression and 30-percent power added efficiency can be achieved. The intercept point for third-order intermodulation products is 37.5 dBm at 6.2 GHz.
  • Keywords
    Electric variables; Electrodes; Fabrication; Gain; Gallium arsenide; Grounding; Inductance; Joining processes; Microwave FETs; Power generation;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18416
  • Filename
    1478430