DocumentCode
1052884
Title
CMOS-SOI platform for monolithic integration of crystalline silicon MEMS
Author
Villarroya, M. ; Figueras, E. ; Verd, J. ; Teva, J. ; Abadal, G. ; Pérez-Murano, F. ; Montserrat, J. ; Uranga, A. ; Esteve, J. ; Barniol, N.
Author_Institution
Dept. of Electron. Eng., Univ. Autonoma de Barcelona, Bellaterra, Spain
Volume
42
Issue
14
fYear
2006
fDate
7/6/2006 12:00:00 AM
Firstpage
800
Lastpage
801
Abstract
A new platform for the fabrication of crystalline micro- and nano-electromechanical systems fully integrable with CMOS is presented. A pre-CMOS process on SOI wafers allows bulk silicon areas for standard CMOS processing and areas with a stack layer of silicon and silicon oxide to be obtained, in which a set of microelectromechanical devices can be fabricated. An integrated resonant beam system with electrical actuation and detection fabricated according to the presented approach is provided.
Keywords
CMOS integrated circuits; micromechanical devices; nanoelectronics; silicon-on-insulator; CMOS-SOI platform; SOI wafers; crystalline silicon MEMS; electrical actuation; electrical detection; integrated resonant beam system; microelectromechanical systems; monolithic integration; nanoelectromechanical systems;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20061097
Filename
1661981
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