DocumentCode
1052944
Title
Long-wavelength InAlGaAs VCSELs with Al2O3 embedded current-confinement apertures
Author
Song, H.-W. ; Han, W.S. ; Kim, J. ; Kim, J.-H. ; KoPark, S.-H.
Author_Institution
IT Convergence & Components Lab., Electron. & Telecommun. Res. Inst., Daejeon, South Korea
Volume
42
Issue
14
fYear
2006
fDate
7/6/2006 12:00:00 AM
Firstpage
808
Lastpage
809
Abstract
Long-wavelength InAlGaAs VCSELs with Al2O3 embedded current-confinement structures are reported. Using atomic layer deposition, the current confinement structures are fabricated by depositing Al2O3 on airgap surfaces of undercut apertures, which are formed by laterally etching the active region. 1.57 μm VCSELs showing an output power of over 1 mW and direct modulation characteristics at 4 Gbit/s are reported using these current-confinement apertures.
Keywords
III-V semiconductors; aluminium compounds; atomic layer deposition; gallium arsenide; indium compounds; quantum well lasers; surface emitting lasers; 1 mW; 1.57 micron; 4 Gbit/s; Al2O3; InAlGaAs; airgap surfaces; atomic layer deposition; current-confinement apertures; embedded current-confinement structures; undercut apertures; vertical-cavity surface-emitting lasers;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20061534
Filename
1661986
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