DocumentCode
1053066
Title
Strain enhanced DC-RF performance of 0.13 μm nMOSFETs on flexible plastic substrate
Author
Chin, A. ; Kao, H.L. ; Kao, C.H. ; Liao, C.C. ; Tseng, Y.Y. ; Chi, C.C.
Author_Institution
Dept. of Electron. Eng., Univ. Syst. of Taiwan, Hsinchu, Taiwan
Volume
42
Issue
14
fYear
2006
fDate
7/6/2006 12:00:00 AM
Firstpage
827
Lastpage
829
Abstract
A 14.3% saturation current Id,sat improvement and 0.75 dB minimum noise figure (NFmin) at 10 GHz were measured by applying ∼0.7% tensile strain for 16 finger, 0.13 μm RF MOSFETs with thin-body (40 μm) substrate mounted on plastic. These excellent results for mechanical-strain on DC-RF MOSFETs are better than those of SiN-capped 90 nm strained-Si nMOSFETs and consistent with device simulations.
Keywords
MOSFET; flexible electronics; plastics; silicon; stress effects; substrates; 0.13 micron; 0.75 dB; 10 GHz; DC-RF MOSFET; Si; flexible plastic substrate; mechanical-strain; nMOSFET; noise figure; polyethylene substrates; saturation current; tensile strain;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20061035
Filename
1661998
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