DocumentCode
1054414
Title
Photodiodes and junction field-effect transistors with high UV sensitivity
Author
Von Muench, Waldemar ; Gessert, Cord ; Koeniger, Max E.
Author_Institution
Institut A fuer Werkstoffkunde der Technischen Universitaet Hannover, Appelstrasse, Germany
Volume
23
Issue
11
fYear
1976
fDate
11/1/1976 12:00:00 AM
Firstpage
1203
Lastpage
1207
Abstract
Silicon photodiodes and photo-FET´s with high blue and UV sensitivity have been produced by a special boron diffusion process. Diodes with a junction depth around 0.2 µm exhibit a responsivity of 0.1 A/W at 253 nm; the maximum responsivity (with a quantum efficiency close to 100 percent) is reached at 440 nm. The responsivity of the photo-FET´s operating in the photoconductive mode (VGS = 0) exceeds 103A/W at 350 nm. The spectral response curve and the large-signal behavior of the photo-FET´s are strongly dependent on the operating conditions.
Keywords
Boron; Diffusion processes; FETs; Impurities; Optical surface waves; Photodiodes; Photovoltaic cells; Silicon; Spontaneous emission; Surface resistance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1976.18579
Filename
1478592
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