• DocumentCode
    1054414
  • Title

    Photodiodes and junction field-effect transistors with high UV sensitivity

  • Author

    Von Muench, Waldemar ; Gessert, Cord ; Koeniger, Max E.

  • Author_Institution
    Institut A fuer Werkstoffkunde der Technischen Universitaet Hannover, Appelstrasse, Germany
  • Volume
    23
  • Issue
    11
  • fYear
    1976
  • fDate
    11/1/1976 12:00:00 AM
  • Firstpage
    1203
  • Lastpage
    1207
  • Abstract
    Silicon photodiodes and photo-FET´s with high blue and UV sensitivity have been produced by a special boron diffusion process. Diodes with a junction depth around 0.2 µm exhibit a responsivity of 0.1 A/W at 253 nm; the maximum responsivity (with a quantum efficiency close to 100 percent) is reached at 440 nm. The responsivity of the photo-FET´s operating in the photoconductive mode (VGS= 0) exceeds 103A/W at 350 nm. The spectral response curve and the large-signal behavior of the photo-FET´s are strongly dependent on the operating conditions.
  • Keywords
    Boron; Diffusion processes; FETs; Impurities; Optical surface waves; Photodiodes; Photovoltaic cells; Silicon; Spontaneous emission; Surface resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1976.18579
  • Filename
    1478592