Title :
IIIA-1 pathways to finer device dimensions (invited tutorial)
fDate :
11/1/1976 12:00:00 AM
Keywords :
Electron beams; Etching; Instruments; Large scale integration; Optical device fabrication; Polymers; Resists; Tutorial; Writing; X-ray lithography;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1976.18607
