Title :
IIIA-2 X-ray lithographic replication of electron beam generated patterns
Author :
Watts, R.K. ; Guterman, D.C. ; Blocker, T.G.
fDate :
11/1/1976 12:00:00 AM
Keywords :
Biomembranes; Electron beams; Etching; Instruments; Large scale integration; Optical device fabrication; Polymers; Resists; Writing; X-ray lithography;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1976.18610
