DocumentCode :
1054772
Title :
Pulsed KrF laser annealing of blue emitting SrS:Cu,Ag thin films
Author :
Liew, S.C. ; Koutsogeorgis, D.C. ; Cranton, W.M. ; Thomas, C.B.
Author_Institution :
Centre For Creative Technol., Nottingham Trent Univ., UK
Volume :
38
Issue :
23
fYear :
2002
fDate :
11/7/2002 12:00:00 AM
Firstpage :
1466
Lastpage :
1468
Abstract :
The first successful attempt at utilising pulsed KrF (248 nm) laser annealing as a post-deposition process for RF sputtered SrS:Cu,Ag phosphor films used for thin film electroluminescent (TFEL) devices is presented. Using this novel annealing method, the luminance of the TFEL devices is observed to improve as laser fluence increases. Hence, the potential for luminance improvement of SrS:Cu,Ag TFEL devices without the need for a high temperature annealing process is demonstrated.
Keywords :
copper; electroluminescence; electroluminescent displays; laser beam annealing; phosphors; silver; sputtered coatings; strontium compounds; thin film devices; thin films; 248 nm; KrF; RF sputtered phosphor films; SrS:Cu,Ag; blue emitting SrS:Cu,Ag thin films; luminance improvement; post-deposition process; pulsed KrF laser annealing; thin film EL device fabrication; thin film electroluminescent displays;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.10491el:20020878
Filename :
1068046
Link To Document :
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