Title :
Introduction to the Special Issue on 2008 International Integrated Reliability Workshop (IIRW)
Author :
Tao, G. ; Lenahan, P. ; Haase, Gundolf ; Young, Cliff ; Strong, A.
fDate :
6/1/2009 12:00:00 AM
Abstract :
The five papers in this special issue were selected from the IEEE International Integrated Reliability Workshop (IIRW) 2008, held on October 12-16, 2008, near South Lake Tahoe, CA.
Keywords :
Circuits; Conferences; High K dielectric materials; High-K gate dielectrics; Lakes; Materials reliability; Niobium compounds; Plasma temperature; Special issues and sections; Titanium compounds;
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
DOI :
10.1109/TDMR.2009.2020526
