• DocumentCode
    1054928
  • Title

    The space-time-averaging procedure and modeling of the RF discharge

  • Author

    Smirnov, Alexander S. ; Tsendin, Lev D.

  • Author_Institution
    Dept. of Plasma Phys., Leningrad State Tech. Univ., USSR
  • Volume
    19
  • Issue
    2
  • fYear
    1991
  • fDate
    4/1/1991 12:00:00 AM
  • Firstpage
    130
  • Lastpage
    140
  • Abstract
    An approach to modeling RF discharges and the ensuing analysis of fast electron and ion motions for the case of electrode sheaths in the high-pressure RF discharge is discussed. Time-averaging over fast electron motions with the applied voltage frequency gives analytic expressions for the average electric field and average ionization density. The resulting relatively simple equations for the ion density profile describe drift, diffusion, ionization, and recombination processes. The simple scaling rules, the approximate expressions for the density profile in various regions, the sheath length, the ion density at the plasma-sheath boundary, and the dimensionless criteria for various discharge regimes can be deduced. For the non-self-sustained discharge, it is demonstrated that the ion drag towards the electrode and the diffusion results in significant lowering of the ion density in the sheath compared with the positive column at not too high a pressure. The analytic transition criterion from α to γ forms of the self-sustained discharge is obtained. The numerical solution of the averaged ion equations yields the results which nearly coincide with the results of full-scale modeling
  • Keywords
    high-frequency discharges; ion recombination; plasma density; plasma sheaths; plasma simulation; plasma transport processes; RF discharge; average electric field; average ionization density; diffusion; drift; electrode sheaths; fast electron motions; fast ion motions; ion density profile; ion drag; modeling; recombination; space-time-averaging procedure; Electrodes; Electrons; Equations; Ionization; Motion analysis; Plasma density; Plasma sheaths; Radio frequency; Spontaneous emission; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.106806
  • Filename
    106806