DocumentCode :
1055038
Title :
Simulation of pulsed electropositive and electronegative plasmas
Author :
Boswell, Rod W. ; Vender, David
Author_Institution :
Res. Sch. of Phys. Sci., Australian Nat. Univ., Canberra, ACT, Australia
Volume :
19
Issue :
2
fYear :
1991
fDate :
4/1/1991 12:00:00 AM
Firstpage :
141
Lastpage :
143
Abstract :
A particle-in-cell (PIC) code with nonperiodic boundary conditions, including ionization and ion motion, is used to simulate the approach to equilibrium and the decay in the postdischarge of model electropositive and electronegative plasmas in a symmetric RF diode. In the electropositive plasma the density decreases to 1/e in ~10 μs. The electronegative ion plasma density is about four times higher and decreases to 1/e in ~50 μs, with the electron temperature and density decreasing to zero in a few microseconds. During this latter time scale, a weak field is set up to drive the negative ions to the boundaries at the same rate as the ion diffusion velocity. In the postdischarge this is close to thermal, hence some hundreds of microseconds are required to remove most of the negative ions from the system. As negative ions are thought to be the precursors for particulate formation, plasmas pulsed at around 1 kHz will severely decrease the lifetime of the negative ions and thereby reduce the possibility of particulate growth
Keywords :
plasma density; plasma diodes; plasma simulation; plasma temperature; 1 kHz; density; ion motion; ionization; lifetime; nonperiodic boundary conditions; particle-in-cell code; particulate growth; postdischarge; pulsed electronegative plasma; pulsed electropositive plasma; simulation; symmetric RF diode; temperature; Boundary conditions; Electrons; Ionization; Plasma accelerators; Plasma applications; Plasma density; Plasma sheaths; Plasma simulation; Plasma temperature; Radio frequency;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.106807
Filename :
106807
Link To Document :
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