DocumentCode :
1055445
Title :
Microwave operation of GaN/AlGaN-doped channel heterostructure field effect transistors
Author :
Khan, Muhammad Asad ; Chen, Qian ; Yang, J.W. ; Shur, M.S. ; Dermott, B.T. ; Higgins, J.A.
Author_Institution :
APA Optics, APA Inc., Blaine, MN, USA
Volume :
17
Issue :
7
fYear :
1996
fDate :
7/1/1996 12:00:00 AM
Firstpage :
325
Lastpage :
327
Abstract :
We report on the microwave operation of 1 μm gate AlGaN/GaN doped channel heterostructure field effect transistors (DC-HFET´s) with the cutoff frequency fT of 18.3 GHz. These devices exhibit the cutoff frequency-gate length product in excess of 18 GHz/spl middot/μm, comparable to that of the state-of-the-art GaAs MESFET´s. We explain these improvements in the device performance by the increased sheet carrier density in the device channel and by a reduction in the parasitic series resistances, caused by doping the device channel.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; junction gate field effect transistors; microwave field effect transistors; 1 micron; 18.3 GHz; DC-HFET; GaN-AlGaN; GaN/AlGaN-doped channel heterostructure field effect transistor; cutoff frequency-gate length product; microwave operation; parasitic series resistance; sheet carrier density; Aluminum gallium nitride; Charge carrier density; Cutoff frequency; Doping; Gallium arsenide; Gallium nitride; HEMTs; MESFETs; MODFETs; Microwave devices;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.506356
Filename :
506356
Link To Document :
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