DocumentCode :
1055910
Title :
HCl chemical lasing with HI and chloro compounds
Author :
Taylor, D. ; Mayer, S.W. ; Suchard, S.N.
Author_Institution :
The Aerospace Corporation, El Segundo, CA, USA
Volume :
10
Issue :
3
fYear :
1974
fDate :
3/1/1974 12:00:00 AM
Firstpage :
389
Lastpage :
390
Abstract :
HCL chemical laser action has been obtained from chloro compounds when HI was used as the source of H atoms. Laser action was produced on several 
, and 1-0 HCl transitions when initiated by transverse pulsed discharges in HI-He mixtures containing such chloro compounds as CCl4 , CHCl3 , and several Freons. Both HCl and HF lasing were observed when a Freon (C2 Cl2 F4 ) containing F as well as Cl was used. The measured wavelengths for these HCl lasers correspond to excellent atmospheric windows for transmission of infrared radiation. No HCl lasing was obtained when HBr, H2 S, or H2 were substituted for HI.
, and 1-0 HCl transitions when initiated by transverse pulsed discharges in HI-He mixtures containing such chloro compounds as CClKeywords :
Atmospheric measurements; Atom lasers; Atomic beams; Chemical compounds; Chemical lasers; Fault location; Hafnium; Laser transitions; Optical pulses; Wavelength measurement;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1974.1068147
Filename :
1068147
Link To Document :
