DocumentCode :
105629
Title :
Breaking down resistance
Author :
Davies, D.
Author_Institution :
IET, Stevenage, UK
Volume :
49
Issue :
6
fYear :
2013
fDate :
March 14 2013
Firstpage :
378
Lastpage :
378
Abstract :
A method to reduce specific on-resistance in AlGaN/GaN HEMTs has been developed in Korea. Requiring no special growth techniques, the devices produced also have excellent breakdown voltage, on/off current ratio and figure-of-merit.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN-GaN; HEMT; breakdown voltage; figure-of-merit value; on-off current ratio;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2013.0697
Filename :
6485045
Link To Document :
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