• DocumentCode
    1056411
  • Title

    Physics of the interaction Process in a typical coaxial virtual cathode oscillator based on computer modeling using MAGIC

  • Author

    Chen, Xiaodong ; Toh, Wee Kian ; Lindsay, Peter A.

  • Author_Institution
    Dept. of Electron. Eng., Univ. of London, UK
  • Volume
    32
  • Issue
    3
  • fYear
    2004
  • fDate
    6/1/2004 12:00:00 AM
  • Firstpage
    1191
  • Lastpage
    1199
  • Abstract
    Physical basis of the interaction process in a typical coaxial vircator has been studied using MAGIC, a three-dimensional PIC computer code. Detailed investigations of the complex dynamics of electrons in and near the interaction space have revealed that it takes ∼6 ns for the virtual cathode to be formed and oscillations to begin. Once the oscillations have started three groups of electrons can be distinguished: those that pass through the semipermeable anode and form a virtual cathode, those that travel parallel to the cylindrical anode, or even around its inner edge in small circles, and finally those called "stray" electrons which are ejected from the cylindrical anode and land on the walls of the output waveguide. We have then shown that by reducing the influence of stray electrons the output power of the vircator can be increased by as much as 52%. As a test of the accuracy of the simulation model the input impedance of the device and its frequency of oscillations have been reproduced, respectively, to within 5% and 2.5% of their measured values.
  • Keywords
    particle beam dynamics; relativistic electron beams; vircators; coaxial virtual cathode oscillator; computer code MAGIC; electron complex dynamics; input impedance; interaction space; oscillation frequency; output waveguide; semipermeable anode; stray electrons; three dimensional PIC computer code; Anodes; Cathodes; Coaxial components; Electrons; Impedance; Oscillators; Physics computing; Power generation; Space exploration; Testing; Coaxial vircator; computer modeling; high-power microwaves; interaction process;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2004.827616
  • Filename
    1321281