DocumentCode :
1056522
Title :
Microfabrication of high-frequency vacuum electron devices
Author :
Ives, R.Lawrence
Author_Institution :
Calabasas Creek Res. Inc., Saratoga, CA, USA
Volume :
32
Issue :
3
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
1277
Lastpage :
1291
Abstract :
Advances in manufacturing technology for microstructures are allowing new opportunities for vacuum electron devices producing radio-frequency (RF) radiation. Specifically, the capability to produce small circuit structures is allowing development of RF devices at frequencies impractical with traditional machining technology. This is generating increased interest in applications in the submillimeter and terahertz frequency range. High-power RF devices in this frequency range are needed for medical, communications, defense, and homeland security applications. This paper describes the most promising microfabrication techniques applicable to high-frequency RF devices and examples of recent applications.
Keywords :
electron device manufacture; submillimetre wave devices; high-frequency vacuum electron devices; high-power RF devices; manufacturing technology; microfabrication techniques; small circuit structures; submillimeter frequency; terahertz frequency; Chemicals; Electron devices; Electron mobility; Field emitter arrays; Machining; Production; Radio frequency; Spectroscopy; Submillimeter wave technology; Vacuum technology; BWO; Backward wave oscillator; DRIE; EDM; FEA; FIB; LIGA; RF source; SU-; cold cathode; deep reactive ion etching; electrical discharge machining; field emission; field emitter array; focused ion beam; radiation; spectroscopy;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2004.827595
Filename :
1321291
Link To Document :
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