DocumentCode :
1056532
Title :
Power absorption by thin films on microwave windows
Author :
Bosman, Herman L. ; Lau, Yue Ying ; Gilgenbach, Ronald M.
Author_Institution :
Dept. of Nucl. Eng. & Radiol. Sci., Univ. of Michigan, Ann Arbor, MI, USA
Volume :
32
Issue :
3
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
1292
Lastpage :
1297
Abstract :
A recent theory for power absorption by continuous thin surface films on microwave windows is compared with experimental data, focusing on diamond gyrotron windows. Two measurement techniques, the dc method by Jory and the radio-frequency (RF) method by Heidinger et al., are used to estimate the fraction of the average power absorbed by the thin films, assuming that these films are spread uniformly over the window surface. Both measurements indicate that, on the average, about a fraction of 1% of the incident power is absorbed by the thin films, even though the local absorption coefficient may reach 50%. Discontinuous surface films, where the surface contaminants have a patchy or island structure, are modeled with an equivalent transmission line circuit. The discontinuous film model is also applied to alumina windows with TiN coatings, and the results are compared with the continuous film model.
Keywords :
absorption coefficients; alumina; coatings; island structure; klystrons; microwave devices; surface contamination; thin films; titanium compounds; Al2O3; RF method; TiN; continuous film model; continuous thin surface films; dc method; diamond gyrotron windows; discontinuous film model; discontinuous surface films; island structure; local absorption coefficient; microwave windows; patchy structure; power absorption; surface contaminants; window surface; Electromagnetic wave absorption; Gyrotrons; Measurement techniques; Microwave theory and techniques; Power measurement; Radio frequency; Surface contamination; Transistors; Transmission line discontinuities; Transmission line measurements; Contaminant; microwave window; thin film;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2004.827579
Filename :
1321292
Link To Document :
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