DocumentCode :
1056647
Title :
Design considerations of high-efficiency double-drift silicon IMPATT diodes
Author :
Chang, Lang-Chee ; Hu, Ding-Huah ; Wang, Chao-Chen
Author_Institution :
Ministry of Communications, Taiwan, Republic of China
Volume :
24
Issue :
6
fYear :
1977
fDate :
6/1/1977 12:00:00 AM
Firstpage :
655
Lastpage :
657
Abstract :
High-efficiency silicon double-drift IMPATT diodes with a low-high-low doping profile structure are proposed. Devices with efficiencies of 25 percent for 12 GHz, 24 percent for 18 GHz, and 19 percent for 50 GHz, are Predicted by numerical calculations.
Keywords :
Chaos; Charge carrier processes; Diodes; Doping profiles; Frequency; Laboratories; Noise measurement; Power generation; Scattering; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1977.18798
Filename :
1478990
Link To Document :
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