DocumentCode
1056647
Title
Design considerations of high-efficiency double-drift silicon IMPATT diodes
Author
Chang, Lang-Chee ; Hu, Ding-Huah ; Wang, Chao-Chen
Author_Institution
Ministry of Communications, Taiwan, Republic of China
Volume
24
Issue
6
fYear
1977
fDate
6/1/1977 12:00:00 AM
Firstpage
655
Lastpage
657
Abstract
High-efficiency silicon double-drift IMPATT diodes with a low-high-low doping profile structure are proposed. Devices with efficiencies of 25 percent for 12 GHz, 24 percent for 18 GHz, and 19 percent for 50 GHz, are Predicted by numerical calculations.
Keywords
Chaos; Charge carrier processes; Diodes; Doping profiles; Frequency; Laboratories; Noise measurement; Power generation; Scattering; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1977.18798
Filename
1478990
Link To Document