Title :
High-Power Large-Aperture Bottom-Emitting 980-nm VCSELs With Integrated GaAs Microlens
Author :
Wang, Zhenfu ; Ning, Yongqiang ; Li, Te ; Cui, Jinjiang ; Zhang, Yan ; Liu, Guangyu ; Zhang, Xing ; Qin, Li ; Liu, Yun ; Wang, Lijun
Author_Institution :
Key Lab. of Excited State Processes, Chinese Acad. of Sci., Changchun
Abstract :
Microlens-integrated bottom-emitting 980-nm vertical-cavity surface-emitting lasers (VCSELs) with an emitting window aperture of 400 mum have been fabricated. A novel material structure with nine InGaAs-GaAsP quantum wells and slightly decreased reflectivity of n-type distributed Bragg reflectors (n-DBRs) are employed to increase the output power. A convex microlens is fabricated by a one-step diffusion-limited wet-etching technique on the GaAs substrate. The diameter of the active layer is about 200 mum after lateral oxidation, and the nominal diameter of the microlens is 400 mum. The maximum output power is 200 mW at continuous-wave operation at room temperature. The far-field divergence angles thetas|| and thetasperp of the single device at a current of 4A are 8.7deg and 8.4deg, respectively. The optical beam performance between the microlens-integrated VCSEL and ordinary VCSEL is compared.
Keywords :
III-V semiconductors; distributed Bragg reflectors; etching; gallium arsenide; indium compounds; microlenses; semiconductor quantum wells; surface emitting lasers; InGaAs-GaAsP; bottom-emitting VCSEL; continuous-wave operation; high-power VCSEL; integrated microlens; large-aperture VCSEL; n-type distributed Bragg reflectors; optical beam; semiconductor quantum wells; temperature 293 K to 298 K; vertical-cavity surface-emitting lasers; wavelength 400 mum; wavelength 980 nm; wet etching; Full-width at half-maximum (FWHM); microlens; power; vertical-cavity surface-emitting lasers (VCSELs);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2008.2010510