DocumentCode :
1058344
Title :
A Novel Three-Dimensional Packaging Method for Al-Metalized SiC Power Devices
Author :
Lang, Fengqun ; Hayashi, Yusuke ; Nakagawa, Hiroshi ; Aoyagi, Masahiro ; Ohashi, Hiromichi
Author_Institution :
Energy Semicond. Electron. Res. Lab., Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Volume :
32
Issue :
4
fYear :
2009
Firstpage :
773
Lastpage :
779
Abstract :
A novel three-dimensional packaging method for Al-metalized SiC power devices has been developed by means of Au stud bumping technology and a subsequent vacuum reflow soldering process with Au-20Sn solder paste. Al-metalized electrodes of a SiC power chip can be robustly assembled to a direct bonded copper (DBC) substrate with this method. The bump shear strength of a Au stud bump on an Al electrode of a SiC chip increased with bonding temperature. The die shear strength of a SiC chip on the DBC substrate increased with the number of Au stud bumps which were preformed on the Al electrode. The bonded SiC-SBD chips on a DBC substrate were aged at 250degC in a vacuum furnace and the morphologies, die shear strength and electrical properties were investigated after a certain aging time. After 1000 h aging at 250degC, the electrical resistance of the bonded SiC-SBD chips only increased about 0.4%, the residual die shear strength was much higher than that of the IEC749 (or JEITA) standard value, and little morphological change was observed by a micro-focus X-ray TV system. Very little diffusion between Au stud bumps and Au-20Sn solder was observed by scanning electron microscope (SEM) equipped with an energy dispersed X-ray analyzer (EDX). Intermetallic compounds (IMC) evolved at the interface of chip/solder and chip/Au stud bumps after 1000 h aging at 250degC. With this method, power devices with Al bond pads can be three-dimensionally packaged.
Keywords :
X-ray chemical analysis; ageing; aluminium; bonding processes; chemical interdiffusion; gold; gold alloys; power semiconductor devices; scanning electron microscopy; semiconductor device packaging; shear strength; silicon; soldering; solders; tin alloys; wide band gap semiconductors; 3D packaging; Al-SiC; Al-metalized SiC power device; Au-20Sn solder paste; Au-AuSn; DBC substrate; EDX; SEM; SiC-SBD power chip; aging; aluminum bond pads; aluminum electrode; diffusion; direct bonded copper substrate; electrical properties; electrical resistance; energy dispersed X-ray analyzer; gold stud bumping technology; intermetallic compounds; microfocus X-ray TV system; morphological property; residual die shear strength; scanning electron microscope; temperature 250 C; three-dimensional packaging method; time 1000 h; vacuum furnace; vacuum reflow soldering; Al-metalized electrodes; Au stud bump bonding; SiC power device; high temperature electronics; high-power density packaging; three-dimensional packaging;
fLanguage :
English
Journal_Title :
Advanced Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
1521-3323
Type :
jour
DOI :
10.1109/TADVP.2009.2021660
Filename :
5066999
Link To Document :
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