DocumentCode :
1058574
Title :
Temperature dependence of MOSFET characteristics in weak inversion
Author :
Nishida, Masanori ; Ohyabu, Hiroyuki
Author_Institution :
Tokyo Sanyo Electric Company, Ltd., Gumma-ken, Japan
Volume :
24
Issue :
10
fYear :
1977
fDate :
10/1/1977 12:00:00 AM
Firstpage :
1245
Lastpage :
1248
Abstract :
A knowledge of the MOSFET operating in weak inversion is important for circuits with low leakage specifications. This paper discusses the effect of temperature on the MOSFET in weak inversion. The reciprocal slope n of the log IDSversus VGSrelationship between source-drain current IDSand gate bias VGSmay be given by {1 \\over (n - 1 - \\gamma )^{2}} = {2C_{ox}^{2} \\over q\\epsilon_{s}N_{B}} \\Bigg[ {3 \\over 4} {E_{g^{0}} \\over q} - \\Bigg( {3 \\over 2}\\alpha + {k \\over q} \\Bigg) T \\Bigg] with \\alpha \\equiv (k/q)(38.2 - \\ln N_{B} + (3/2) \\ln T) and γ ≡ C_{ss}/C_{ox} , where Coxis the oxide capacitance per unit area, Cssthe surface states capacitance per unit area, q the electronic charge, εsthe permittivity of silicon, NBthe bulk doping concentration, k the Boltzmann\´s constant, T the absolute temperature, and E_{g0} the extrapolated value of the energy gap of lightly doped silicon at T = 0 K. This theoretical formula was in good agreement with experimental results in a temperature range of interest.
Keywords :
Capacitance; Doping; Intrusion detection; MOSFET circuits; Niobium; Permittivity; Silicon; Temperature dependence; Temperature distribution; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1977.18987
Filename :
1479179
Link To Document :
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