• DocumentCode
    1058593
  • Title

    Factors limiting current gain in power transistors

  • Author

    McGrath, Edward John ; Navon, David H.

  • Author_Institution
    University of Massachusetts, Amherst, MA
  • Volume
    24
  • Issue
    10
  • fYear
    1977
  • fDate
    10/1/1977 12:00:00 AM
  • Firstpage
    1255
  • Lastpage
    1259
  • Abstract
    The combined effect of sidewall injection, bandgap narrowing, and Shockley-Hall-Read and Auger recombination in determining emitter efficiency in n-p-n power transistor structures is demonstrated by utilizing a two-dimensional transistor model. The relative importance of each of these effects is calculated as a function of emitter junction depth, emitter surface doping, and injection level. It is shown that in a practical transistor design the reduction in emitter efficiency due to the increased injection of holes into the emitter, resulting from bandgap narrowing caused by heavy doping, is not dominated by the emitter sidewall. Auger recombination is seen to be especially important when bandgap narrowing is present. Enhanced Auger-type recombination is due both to increased minority carrier injection in the emitter as well as current crowding effects. The predictions of the model are compared with results of the measurement of current gain versus current level characteristics on existing devices.
  • Keywords
    Bipolar transistors; Charge carrier lifetime; Helium; Photonic band gap; Power transistors; Radiative recombination; Semiconductor device doping; Semiconductor process modeling; Silicon; Spontaneous emission;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1977.18989
  • Filename
    1479181