DocumentCode :
1058730
Title :
Annealing of degraded npn-transistors-mechanisms and modeling
Author :
Wurzer, H. ; Mahnkopf, R. ; Klose, H.
Author_Institution :
Inst. fur Phys., Bundeswehr Munchen Univ., Germany
Volume :
41
Issue :
4
fYear :
1994
fDate :
4/1/1994 12:00:00 AM
Firstpage :
533
Lastpage :
538
Abstract :
We report on the annealing of degraded npn-transistors, which includes a new model describing the decrease of base current during annealing. We found that two mechanisms are responsible for annealing: the recombination of charges and the bonding of hydrogen atoms on interface traps. Furthermore, we show that a heating of the whole device and a forward biasing of the emitter-base-diode activate these annealing mechanisms. This biasing deactivates the interface traps by recombination with a part of the streaming charge and results in a local increase in temperature, caused by the current. Both local and global heating yield an additional thermal generation of charges and an increasing diffusivity of hydrogen atoms. Consequently, an additional deactivation and passivation of interface traps is detected
Keywords :
annealing; bipolar transistors; electron traps; electron-hole recombination; hole traps; interface electron states; passivation; semiconductor device models; H atom bonding; annealing; base current; deactivation; degraded npn-transistors; emitter-base-diode; forward biasing; heating; interface traps; modeling; n-p-n devices; passivation; recombination; thermal generation; Annealing; Bipolar transistors; Bonding; Degradation; Electron traps; Heating; Hydrogen; Passivation; Stress; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.278506
Filename :
278506
Link To Document :
بازگشت