DocumentCode :
105877
Title :
Si wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography
Author :
Okayama, Hideaki ; Shimura, Daisuke ; Takahashi, Hiroki ; Seki, Morihiro ; Toyama, Munehiro ; Sano, Tomomi ; Koshino, Keiji ; Yokoyama, Naoki ; Ohtsuka, Minoru ; Sugiyama, Akihiko ; Ishitsuka, S. ; Tsuchizawa, Tai ; Nishi, Hidetaka ; Yamada, Koji ; Yaegas
Author_Institution :
Inst. for Photonics-Electron. Convergence Syst. Technol. (PECST), Japan
Volume :
49
Issue :
6
fYear :
2013
fDate :
March 14 2013
Firstpage :
410
Lastpage :
412
Abstract :
An Si wire array waveguide grating wavelength demultiplexer fabricated using immersion ArF lithography is reported. The tilt directions of the input and output star couplers are aligned in the same direction to avoid phase error generated at the curved waveguides. A 16 channel device with 200 GHz wavelength spacing was fabricated.
Keywords :
demultiplexing equipment; immersion lithography; waveguide couplers; wires (electric); ArF excimer immersion lithography; frequency 200 GHz; parallel star coupler configuration; phase error generation; wire array waveguide grating wavelength demultiplexer;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2013.0206
Filename :
6485065
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=105877
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