DocumentCode :
1058789
Title :
A new linear sweep technique to measure generation lifetimes in thin-film SOI MOSFET´s
Author :
Venkatesan, S. ; Pierret, R.F. ; Neudeck, G.W.
Author_Institution :
Sch. of Electr. Eng., Purdue Univ., West Lafayette, IN, USA
Volume :
41
Issue :
4
fYear :
1994
fDate :
4/1/1994 12:00:00 AM
Firstpage :
567
Lastpage :
574
Abstract :
A new linear sweep technique to measure generation lifetimes (τg) in silicon-on-insulator (SOI) material is presented. A detailed analytic formulation is applied to fully-depleted and partially-depleted SOI films and used to simulate the behavior of the SOI devices under linear sweep conditions. A novel algorithm accurately determines the effective generation width in fully depleted SOI films. The measurement technique is experimentally verified by applying the algorithm to fully depleted SIMOX P-channel MOSFET´s where observed lifetimes ranged from 0.3 μs to 2.4 μs
Keywords :
SIMOX; carrier lifetime; electric variables measurement; insulated gate field effect transistors; semiconductor-insulator boundaries; silicon; 0.3 to 2.4 mus; analytic formulation; effective generation width; fully depleted SIMOX P-channel MOSFET; generation lifetime measurement; linear sweep technique; partially-depleted SOI films; simulation; thin-film SOI MOSFET; Capacitance measurement; Isolation technology; MOSFET circuits; Measurement techniques; P-n junctions; Pulse measurements; Semiconductor materials; Silicon on insulator technology; Thickness measurement; Transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.278511
Filename :
278511
Link To Document :
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