DocumentCode :
1059063
Title :
Noise in NbTiN, Al, and Ta Superconducting Resonators on Silicon and Sapphire Substrates
Author :
Barends, R. ; Hortensius, H.L. ; Zijlstra, T. ; Baselmans, J.J.A. ; Yates, S.J.C. ; Gao, J.R. ; Klapwijk, T.M.
Author_Institution :
Kavli Inst. of Nanosci., Delft Univ. of Technol., Delft, Netherlands
Volume :
19
Issue :
3
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
936
Lastpage :
939
Abstract :
We present measurements of the frequency noise and resonance frequency temperature dependence in planar superconducting resonators on both silicon and sapphire substrates. We show, by covering the resonators with sputtered SiOx layers of different thicknesses, that the temperature dependence of the resonance frequency scales linearly with thickness, whereas the observed increase in noise is independent of thickness. The frequency noise decreases when increasing the width of the coplanar waveguide in NbTiN on hydrogen passivated silicon devices, most effectively by widening the gap. We find up to an order of magnitude more noise when using sapphire instead of silicon as substrate. The complete set of data points towards the noise being strongly affected by superconductor-dielectric interfaces.
Keywords :
aluminium; dielectric devices; niobium; nitrogen; superconducting resonators; tantalum; titanium; Al; NbTiN; Ta; frequency noise; hydrogen passivated silicon devices; planar superconducting resonators; resonance frequency temperature dependence; silicon-sapphire substrates; superconductor-dielectric interfaces; Dielectrics; interface; kinetic inductance; noise; superconducting resonators;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/TASC.2009.2018086
Filename :
5067054
Link To Document :
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