DocumentCode :
105909
Title :
Analytical Expression for Thermionic Transport Through Isotype Heterojunction Interfaces of Arbitrary Doping Ratio
Author :
Gil, Maria ; Jingfeng Yang ; Kleiman, Rafael N.
Author_Institution :
Dept. of Eng. Phys., McMaster Univ., Hamilton, ON, Canada
Volume :
61
Issue :
1
fYear :
2014
fDate :
Jan. 2014
Firstpage :
198
Lastpage :
201
Abstract :
We present an analytical expression for the current density across an isotype heterojunction valid for arbitrary doping concentration ratios. This result generalizes the standard expression found in the literature, which is limited by the assumption that the doping concentration ratio is equal to one. This result relies on the solution of a transcendental equation associated with the heterojunction boundary conditions by means of the Lambert W function. As done in the derivation of the standard expression, the generalization only considers thermionic emission, but the method can equally be applied for other transport mechanisms. The general result mathematically contains the expression for the current density across a metal-semiconductor Schottky contact as a limiting case, unifying the treatment of these two heterointerfaces into a single general analytical description.
Keywords :
Schottky barriers; current density; semiconductor doping; thermionic emission; Lambert W function; analytical expression; arbitrary doping ratio; current density; heterojunction boundary conditions; isotype heterojunction interfaces; metal-semiconductor Schottky contact; thermionic emission; thermionic transport; transport mechanisms; Current density; Doping; Educational institutions; Equations; Heterojunctions; Physics; Schottky barriers; Isotype heterojunctions; Lambert W function; Schottky diodes; semiconductor device modeling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2290087
Filename :
6672023
Link To Document :
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