• DocumentCode
    1059158
  • Title

    Transparent gate silicon photodetectors

  • Author

    Schroder, Dieter K.

  • Author_Institution
    Westinghouse Research and Development Center, Pittsburgh, PA
  • Volume
    25
  • Issue
    2
  • fYear
    1978
  • fDate
    2/1/1978 12:00:00 AM
  • Firstpage
    90
  • Lastpage
    97
  • Abstract
    Optical and electrical properties of silicon imaging devices with In2O3-SnO2gates are reported. The optically transparent electrically conducting films were sputtered from both glass and metal targets. Quantum efficiencies of such devices are significantly better than photodiodes or polysilicon gate devices. The electrical properties such as dark current and interface state density are as low as conventional aluminum gate devices after appropriate anneals.
  • Keywords
    Conductive films; Dark current; Glass; Interface states; Optical devices; Optical films; Optical imaging; Photodetectors; Photodiodes; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1978.19044
  • Filename
    1479438