DocumentCode
1059158
Title
Transparent gate silicon photodetectors
Author
Schroder, Dieter K.
Author_Institution
Westinghouse Research and Development Center, Pittsburgh, PA
Volume
25
Issue
2
fYear
1978
fDate
2/1/1978 12:00:00 AM
Firstpage
90
Lastpage
97
Abstract
Optical and electrical properties of silicon imaging devices with In2 O3 -SnO2 gates are reported. The optically transparent electrically conducting films were sputtered from both glass and metal targets. Quantum efficiencies of such devices are significantly better than photodiodes or polysilicon gate devices. The electrical properties such as dark current and interface state density are as low as conventional aluminum gate devices after appropriate anneals.
Keywords
Conductive films; Dark current; Glass; Interface states; Optical devices; Optical films; Optical imaging; Photodetectors; Photodiodes; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1978.19044
Filename
1479438
Link To Document