DocumentCode :
1059158
Title :
Transparent gate silicon photodetectors
Author :
Schroder, Dieter K.
Author_Institution :
Westinghouse Research and Development Center, Pittsburgh, PA
Volume :
25
Issue :
2
fYear :
1978
fDate :
2/1/1978 12:00:00 AM
Firstpage :
90
Lastpage :
97
Abstract :
Optical and electrical properties of silicon imaging devices with In2O3-SnO2gates are reported. The optically transparent electrically conducting films were sputtered from both glass and metal targets. Quantum efficiencies of such devices are significantly better than photodiodes or polysilicon gate devices. The electrical properties such as dark current and interface state density are as low as conventional aluminum gate devices after appropriate anneals.
Keywords :
Conductive films; Dark current; Glass; Interface states; Optical devices; Optical films; Optical imaging; Photodetectors; Photodiodes; Silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19044
Filename :
1479438
Link To Document :
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