DocumentCode
1060088
Title
Thermal-oxide gate GaAs MOSFET´s
Author
Takagi, H. ; Kano, G. ; Teramoto, I.
Author_Institution
Matsushita Electronics Corporation Research Laboratory, Takatsuki, Osaka, Japan
Volume
25
Issue
5
fYear
1978
fDate
5/1/1978 12:00:00 AM
Firstpage
551
Lastpage
552
Abstract
The first thermal-oxide gate GaAs MOSFET of the deep-depletion mode is reported. The gate oxide, which has been grown by the new GaAs oxidation technique in the As2 O3 vapor, is so chemically stable that it can be subjected to the fabrication process. Measurement of some dc characteristics of the device fabricated has shown a strikingly suppressed hysteresis.
Keywords
DH-HEMTs; Distortion measurement; Equivalent circuits; Frequency modulation; Gallium arsenide; Harmonic analysis; Harmonic distortion; Light emitting diodes; Optical distortion; Thermal conductivity;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1978.19131
Filename
1479525
Link To Document